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Computational lithography

Published: Oxford : Wiley-Blackwell, 2010
Format: Electronic Resource, Remote
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Computational lithography

Published: Hoboken, N.J. : Wiley, c2010
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Contamination-free manufacturing for semiconductors and other precision products

Published: New York : Marcel Dekker, c2001
Format: Print
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ESD analog circuits and design

Published: Chichester, West Sussex : John Wiley & Sons Ltd., [2015]
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ESD : design and synthesis

Published: Chichester, West Sussex, U.K. : Wiley, 2011
Format: Print
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ESD design and synthesis

Published: Chichester, West Sussex, U.K. : Wiley, 2011
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The essential guide to semiconductors

Published: Upper Saddle River, NJ : Prentice Hall, c2003
Format: Print
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The essential guide to semiconductors

Published: Upper Saddle River, NJ : Prentice Hall, c2003
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Fabless semiconductor implementation

Published: New York : McGraw-Hill, c2008
Format: Print
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Fundamentals of semiconductor fabrication

Published: New York : Wiley, c2004
Format: Print
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Fundamentals of semiconductor manufacturing and process control

Published: [Piscataway] : IEEE ; Hoboken, N.J. : Wiley-Interscience, c2006
Format: Print
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Future trends in microelectronics

Published: New York : Wiley, 1999
Format: Print
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Future trends in microelectronics : the nano millennium

Published: New York : IEEE, the Institute of Electrical and Electronics Engineers ; Hoboken, N.J. : Wiley-Interscience, c2002
Format: Print
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Handbook of semiconductor manufacturing technology

Published: New York : Marcel Dekker, c2000
Format: Print
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Hardening semiconductor components against radiation and temperature

Published: Park Ridge, N.J., U.S.A. : Noyes Data Corp., c1989
Format: Print
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